Online Wet Process Micro Particle Automation Monitoring Solution

Multi-channel Liquid Particle Counter

Inline 24-Hour Monitoring of Micro-Nano Particle Variations

The multi-channel liquid particle detection system enables continuous long-term monitoring of particle counts, providing real-time insights into particle trends across different process stages.
Establishing Stable Process Standards

Provides a basis for equipment cleanliness and process stability standards, ensuring consistent quality across production stages and improving yield rates.
Multi-Point Monitoring with One Device, Reducing Equipment Costs

Unlike conventional single-channel particle counters, FlowVIEW’s multi-channel liquid particle detection system features nine detection channels, allowing monitoring at multiple points within the same production line. It can also be seamlessly integrated into existing production equipment, effectively reducing equipment costs.
Defect Prediction to Reduce Costs from Process Abnormalities

The automatic alert system triggers warnings when cleanliness levels reach the threshold, providing real-time data feedback for operators to take early action. It also helps predict maintenance cycles, allowing for timely filter replacements and preventing production losses due to microcontamination.
Versatile Chemical Liquid Applications

Ideal for detecting developer solutions, mixed acid photoresist removers, copper/aluminum acids, and DI water.

LD/PD aligned in a straight line

LD/PD arranged at an angle

Model	FlowVIEW DI series / Chem series
Particle Size Range	0.1μm-100μm more..
Total Inspection Channels	9 Liquid Feed Channels
Cleaning Channel	1 Cleaning Channel
Temperature / Viscosity	5-80 °C / 150 cps
Concentration Limit	4,000 P/ml @ 5% coincidence error
Transmission	Internet / RS485 / Modbus
Overall Dimensions	W850 x L550 x H1629 mm (±5mm)
Weight	105 kg (±5 kg)
Add-on Items	De-Bubbles / Liquid Recirculation System

Main Interface

System Interface

Particle Monitoring Trend Analysis Chart

	Midstream	Downstream
Raw Material Quality Control OQC, IPQC	Chemical Raw Materials Isopropyl alcohol (IPA), release agent, developer, cleaning agent (KOH), stripper	Chemical Raw Materials Electroless plating solution, electroplating solution, deionized water, metal etching solution, stripping solution, release agent, copper etchant, aluminum etchant
Incoming Material Quality Control IQC
Process Quality Monitoring IPQC、PQC、OQC	Wafer Manufacturing Etching process, stripping process, photolithography process, cleaning process	PCB Electroless plating process, electroplating process, etching process, stripping process Packaging Cleaning process